For the coordination of the contradictory , the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask . it includes : pupil filtering , phase shift mask , off - axis illumination , optical proximity correction , and so on 為了協(xié)調(diào)這種矛盾,利用波前工程來(lái)改善光刻圖形的質(zhì)量以提高光刻分辨率,已廣泛地應(yīng)用于光學(xué)光刻中,如:瞳孔濾波、相移掩模、離軸照明、光學(xué)鄰近效應(yīng)校正等。
The schwarzschild objective with eccentric aperture and off - axis illumination is designed on the basic of common - axis illuminated structure . a detailed theoretical analysis of the alignment is taken . the mathematical model is established and the relation between aberration and construction is described 對(duì)計(jì)算機(jī)輔助計(jì)算的精密裝調(diào)技術(shù)進(jìn)行了詳細(xì)的理論分析,建立了數(shù)學(xué)模型,闡明了像差與各個(gè)結(jié)構(gòu)參數(shù)的相關(guān)性,分析影響各種像差的主要因素,制定了裝調(diào)方案。
In photolithography, off-axis illumination is an optical system setup in which the incoming light strikes the photomask at an oblique angle rather than perpendicularly to it, that is to say, the incident light is not parallel to the axis of the optical system.